Chemical vapour deposition of crystalline thin films of tantalum phosphide
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چکیده
منابع مشابه
Chemical vapour deposition of Group Vb metal phosphide thin films
The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 and VOCl3 with cyclohexylphosphine at substrate temperatures of 600 C deposits thin films of amorphous vanadium phosphide. The films are black/gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 C – 600 C deposits films of crystalline -MP ...
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Boron included aluminium nitride (B-AlN) thin films were synthesized on silicon (Si) substrates through chemical vapour deposition ( CVD ) at 773 K (500 °C). tert-buthylamine (tBuNH2) solution was used as nitrogen source and delivered through gas bubbler. B-AlN thin films were prepared on Si-100 substrates by varying gas mixture ratio of three precursors. The structural properties of the films ...
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ژورنال
عنوان ژورنال: Materials Letters
سال: 2003
ISSN: 0167-577X
DOI: 10.1016/s0167-577x(02)01341-1